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Trade Shows

JNMTE, Qingdao, China
08/02 – 08/06/2018


CIEME, Shenyang, China
09/01 – 09/05/2018


News

Launching the xPro4C


2017 – a year with challenges

SYSTEMS

xPro – S2

Vacuum Hard Coating System With New PDA III*-Technology and HiParc-Technology (optional)

The xPro – S2 is the most advanced industrial small size vacuum coating system, which includes the PDA*-technology. It is specifically designed for the deposition of high performance metallurgical coatings, such as AlCrSiN, AlTiSiN, AlCrN, AlTiN, CrN, TiC,N, TiN and many others. Such coatings are evaporated by arc onto a variety of cutting tools, dies and moulds, components and consumer products for wear, erosion and  corrosion protection as well as tribological purposes. The xPro – S2 is also in a “pulsed” high power version as xPro – S2H (HiParc**) available, where the technology and power supply package enables faster deposition rates, shorter cycle times and significantly improved target utilisation.

xPro – S2


The xPro – S2 is characterized by:


Technical Highlights of the xPro – S2:

PDA III*-Technology

  • PDA III* “Plasma-Diffused-Arc” for the deposition of smooth, more compact coatings

Magnetic arc confinement MACIII*

  • High target utilization
  • Drastically reduced micro-particle formation

Short process time

  • Increased heating capabilities
  • Efficient cleaning and etching cycle

Improved coating properties

  • Advanced interface formation
  • Extremely clean process environment

Improved part handling and fixturing

  • Safest most manoeuvrable transport carts
  • Easy to load and use carts with high load capabilities

Improved software design

  • Extreme ease of use
  • Highly reproducible runs
  • High level of flexibility for custom tailored coating solutions
  • Remote control and diagnostics

Improved thermal management

  • Intensive water cooling
  • Double walled construction

Most reliable components

  • Brand name components
  • Clever integration

System Data

Size of vacuum chamber 680 × 650 × 1,150 mm (L × W × H)
Coating volume 350 × 720 mm (Ø × H)
No. of rotary platform
(substrate carrier)
2
Size of rotary platform
(substrate carrier)
480 × 430 × 1,015 mm (L × W × H)
Pumping 2 double stage rotary vane pumps
1 turbomolecular pump
Sources 2 large area arc evaporators
Power supplies 2 arc power supplies @ 210 A
optional: 400 A pulsed (HiParc**)
1 pc 10 kW dc bias power supply
Heater 2 pcs, rated @ 12 kW each
Overall size 3,370 × 1,635 × 2,220 mm (L × B × H)
Power 80 kW, 400 V, 3 ph + N, 50/60 Hz

System capacity

Plasma volume 350 × 720 mm (Ø × H)
End mills Ø 4 × 50 mm 1,340 pcs
End mills Ø 12 × 75 mm 480 pcs
Inserts ½″ x ½″ x 4 mm 2,800 pcs
Hobs Ø 80 × 80 mm 72 pcs
Hobs Ø 100 × 100 mm 42 pcs

*PDA = Plasma-Diffused-Arc
**HiParc = High Power Pulsed Arc

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