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CCTE – Shanghai, PR China
02/26 – 03/01/2019


CWIEME – Xi´an, PR China
03/14 – 03/17/2019


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SYSTEMS

xPro – M3

Vacuum Hard Coating System With New PDA III*-Technology and HiParc-Technology (optional)

The xPro – M3 is the most advanced industrial medium size vacuum coating system, which includes the PDA*-technology. It is specifically designed for the deposition of high performance metallurgical coatings, such as AlCrSiN, AlTiSiN, AlCrN, AlTiN, CrN, TiC,N, TiN and many others. Such coatings are evaporated by arc onto a variety of cutting tools, dies and moulds, components and consumer products for wear, erosion and  corrosion protection as well as tribological purposes. The xPro – M3 is also in a “pulsed” high power version as xPro – M3H available (HiParc**), where the technology and power supply package enables faster depositon rates, shorter cycle times and significantly improved target utilisation.

xPro – M3


The xPro – M3 is characterized by:


Technical Highlights of the xPro – M3:

PDA III*-Technology

  • PDA III* “Plasma-Diffused-Arc” for the deposition of smooth, more compact coatings

Magnetic arc confinement MACIII*

  • High target utilization
  • Drastically reduced micro-particle formation

Short process time

  • Increased heating capabilities
  • Efficient cleaning and etching cycle

Improved coating properties

  • Advanced interface formation
  • Extremely clean process environment

Improved part handling and fixturing

  • Safest most manoeuvrable transport carts
  • Easy to load and use carts with high load capabilities

Improved software design

  • Extreme ease of use
  • Highly reproducible runs
  • High level of flexibility for custom tailored coating solutions
  • Remote control and diagnostics

Improved thermal management

  • Intensive water cooling
  • Double walled construction

Most reliable components

  • Brand name components
  • Clever integration

System Data

Size of vacuum chamber 860 × 860 × 1,150 mm (L × W × H)
Coating volume 520 × 720 mm (Ø × H)
No. of rotary platform
(substrate carrier)
2
Size of rotary platform
(substrate carrier)
660 ×650 × 1,015 mm (L × W × H)
Pumping 2 double stage rotary vane pumps
1 roots pump
1 turbomolecular pump
Sources 3 large area arc evaporators
Power supplies 3 arc power supplies @ 210 A
optional: 400 A pulsed (HiParc**)
1 pc 15 kW dc bias power supply
Heater 3 pcs, rated @ 12 kW each
Overall size 3,650 × 1,615 × 2,220 mm (L × B × H)
Power 100 kW, 400 V, 3 ph + N, 50/60 Hz

System capacity

Plasma volume 520 × 740 mm (Ø × H)
End mills Ø 4 × 50 mm 2,100 pcs
End mills Ø 12 × 75 mm 720 pcs
Inserts ½″ x ½″ x 4 mm 4,400 pcs
Hobs Ø 80 × 80 mm 128 pcs
Hobs Ø 100 × 100 mm 78 pcs

*PDA = Plasma-Diffused-Arc
**HiParc = High Power Pulsed Arc

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